Canon has begun selling its nanoimprint semiconductor manufacturing systems, seeking to claw back market share by positioning the technology as a simpler and more attainable alternative to the leading-edge tools of today. From a report: The Tokyo-based company’s new chipmaking machines can produce circuits equivalent to 5-nanometer scale when using extreme ultraviolet lithography (EUV), a field dominated by industry leader ASML Holding NV. Canon expects its device to reach next-generation 2nm production with further advances and improvements, it said in a statement on Friday. Like domestic peer Nikon Corp., Canon has fallen far behind ASML in the EUV race, but its nanoimprint lithography approach may help it close the gap.
Canon’s machinery may also add a new front in the US-China trade war, as the import of EUV machines — so far the only reliable method for fabricating 5nm chips and smaller — into China is prohibited by trade sanctions. The Japanese firm’s technique skips photolithography altogether and instead impresses the desired circuit pattern onto the silicon wafer. Because of its novelty, it’s unlikely to be expressly forbidden by existing trade curbs.
